Training on doping by Ionic Implantation

This course provides an overview and familiarization with the technique of doping semiconductors by ion implantation. It is intended for engineers, technicians, and students involved in the semiconductor industry who wish to learn the basics of microelectronics.

Training program:

1. Theoretical training:

An introductory course in the ion implantation technique (ion implantation base, machine,… etc.) will be presented.

Duration: Half day

2. Practical training:

In this part, practical work will be carried out in the clean room and will cover the following aspects:

• Presentation of the implementation equipment
• Implantation of silicon wafers by both types of dopants N and P
• Square resistance measurement using the four-point technique.

Duration: Half day